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Growth of free-standing bulk wurtzite AlxGa1?xN layers by molecular beam epitaxy using a highly efficient RF plasma source (2016)
Journal Article

The recent development of group III nitrides allows researchers world-wide to consider AlGaN based light emitting diodes as a possible new alternative deep ultra–violet light source for surface decontamination and water purification. In this paper we... Read More about Growth of free-standing bulk wurtzite AlxGa1?xN layers by molecular beam epitaxy using a highly efficient RF plasma source.

Molecular beam epitaxy of free-standing bulk wurtzite AlxGa1-xN layers using a highly efficient RF plasma source (2016)
Journal Article

Recent developments with group III nitrides suggest AlxGa1-xN based LEDs can be new alternative commer-cially viable deep ultra-violet light sources. Due to a sig-nificant difference in the lattice parameters of GaN and AlN, AlxGa1-xN substrates woul... Read More about Molecular beam epitaxy of free-standing bulk wurtzite AlxGa1-xN layers using a highly efficient RF plasma source.