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Characterization of p-GaN1−xAsx/n-GaN PN junction diodes

Qian, H.; Lee, K.B.; Vajargah, S.Hosseini; Novikov, S.V.; Guiney, I.; Zhang, S.; Zaidi, Z.H.; Jiang, S.; Wallis, D.J.; Foxon, C.T.; Humphreys, C.J.; Houston, P.A.

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Authors

H. Qian

K.B. Lee

S.Hosseini Vajargah

I. Guiney

S. Zhang

Z.H. Zaidi

S. Jiang

D.J. Wallis

C.T. Foxon

C.J. Humphreys

P.A. Houston



Abstract

The structural properties and electrical conduction mechanisms of p-type amorphous GaN1−xAsx/n-type crystalline GaN PN junction diodes are presented. A hole concentration of 8.5×1019 cm−3 is achieved which allows a specific contact resistance of 1.3×10−4 Ω cm2. An increased gallium beam equivalent pressure during growth produces reduced resistivity but can result in the formation of a polycrystalline structure. The conduction mechanism is found to be influenced by the crystallinity of the structure. Temperature dependent current voltage characteristics at low forward bias (<0.35 V) show that conduction is recombination dominated in the amorphous structure whereas a transition from tunneling to recombination is observed in the polycrystalline structure. At higher bias, the currents are space charge limited due to the low carrier density in the n-type region. In reverse bias, tunneling current dominates at low bias(<0.3 V) and recombination current becomes dominant at higher reverse bias.

Citation

Qian, H., Lee, K., Vajargah, S., Novikov, S., Guiney, I., Zhang, S., Zaidi, Z., Jiang, S., Wallis, D., Foxon, C., Humphreys, C., & Houston, P. (2016). Characterization of p-GaN1−xAsx/n-GaN PN junction diodes. Semiconductor Science and Technology, 31(6), https://doi.org/10.1088/0268-1242/31/6/065020

Journal Article Type Article
Acceptance Date Apr 28, 2016
Online Publication Date May 12, 2016
Publication Date Jun 3, 2016
Deposit Date Jul 11, 2016
Publicly Available Date Jul 11, 2016
Journal Semiconductor Science and Technology
Print ISSN 0268-1242
Electronic ISSN 1361-6641
Publisher IOP Publishing
Peer Reviewed Peer Reviewed
Volume 31
Issue 6
DOI https://doi.org/10.1088/0268-1242/31/6/065020
Keywords GaN, PN diode, conduction mechanism, p-type doping, amorphous GaNAs
Public URL https://nottingham-repository.worktribe.com/output/796837
Publisher URL http://iopscience.iop.org/article/10.1088/0268-1242/31/6/065020/meta
Contract Date Jul 11, 2016

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