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Impact of Vth Instability of Schottky-type p-GaN Gate HEMTs on Switching Behaviors

Lu, Xuyang; Videt, Arnaud; Faramehr, Soroush; Li, Ke; Marsic, Vlad; Igic, Petar; Idir, Nadir

Impact of Vth Instability of Schottky-type p-GaN Gate HEMTs on Switching Behaviors Thumbnail


Authors

Xuyang Lu

Arnaud Videt

Soroush Faramehr

Dr KE LI Ke.Li2@nottingham.ac.uk
ASSISTANT PROFESSOR

Vlad Marsic

Petar Igic

Nadir Idir



Abstract

Schottky-type p-GaN gate Gallium Nitride High Electron Mobility Transistors (GaN-HEMTs) suffer from threshold voltage ( Vth ) instability phenomenon. Both positive and negative Vth shifts are reported when device undertakes the voltage bias, but the impact of this Vth instability phenomenon on device switching behaviors is less investigated. In this study, the drain-source voltage ( Vds ) induced bidirectional Vth shift in hard-switching condition is characterized and decoupled by an H-bridge based double-pulse test (DPT). Subsequently, the influence of Vth shift on switching behaviors is theoretically analyzed and demonstrated through SPICE simulation and experiment, showing how a positive shifted Vth can reduce the device turn-on commutation speed and increase the switching losses, and vice versa. The results suggest that the Vth instability phenomenon should be considered in accurate switching modeling.

Citation

Lu, X., Videt, A., Faramehr, S., Li, K., Marsic, V., Igic, P., & Idir, N. (2024). Impact of Vth Instability of Schottky-type p-GaN Gate HEMTs on Switching Behaviors. IEEE Transactions on Power Electronics, 39(9), 11625-11636. https://doi.org/10.1109/tpel.2024.3405320

Journal Article Type Article
Acceptance Date Jan 25, 2024
Online Publication Date May 24, 2024
Publication Date 2024-09
Deposit Date Jun 14, 2024
Publicly Available Date Jun 18, 2024
Journal IEEE Transactions on Power Electronics
Print ISSN 0885-8993
Electronic ISSN 1941-0107
Publisher Institute of Electrical and Electronics Engineers
Peer Reviewed Peer Reviewed
Volume 39
Issue 9
Pages 11625-11636
DOI https://doi.org/10.1109/tpel.2024.3405320
Public URL https://nottingham-repository.worktribe.com/output/35445448
Publisher URL https://ieeexplore.ieee.org/document/10538414

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