H2 production from a plasma-assisted chemical looping system from the partial oxidation of CH4 at mild temperatures
(2019)
Journal Article
Zheng, Y., Marek, E., & A. Scott, S. (2020). H2 production from a plasma-assisted chemical looping system from the partial oxidation of CH4 at mild temperatures. Chemical Engineering Journal, 379, Article 122197. https://doi.org/10.1016/j.cej.2019.122197
A plasma-assisted chemical looping system for the production of H2 (PCLH) was investigated in this study. This system allows the partial oxidation of CH4 at mild temperatures (573–773 K). Four active oxygen carriers: Fe2O3, NiO-impregnated Fe2O3 (NiO... Read More about H2 production from a plasma-assisted chemical looping system from the partial oxidation of CH4 at mild temperatures.