A microscopy approach for in situ inspection of the ?CMM stylus for contamination
(2017)
Journal Article
Feng, X., Pascal, J., & Lawes, S. (in press). A microscopy approach for in situ inspection of the ?CMM stylus for contamination. Measurement Science and Technology, 28(9), https://doi.org/10.1088/1361-6501/aa7c93
During the µCMM measurement process, contamination gradually builds up on the surface of the stylus tip and affects dimensional accuracy of the measurement. Regular inspection of the stylus for contamination is essential in determining the appropriat... Read More about A microscopy approach for in situ inspection of the ?CMM stylus for contamination.