Professor SERGEI NOVIKOV sergei.novikov@nottingham.ac.uk
PROFESSOR OF PHYSICS
Molecular beam epitaxy of free-standing bulk wurtzite AlxGa1-xN layers using a highly efficient RF plasma source
Novikov, Sergei V.; Staddon, C.R.; Sahonta, S-L; Oliver, R.A.; Humphreys, C.J.; Foxon, C.T.
Authors
C.R. Staddon
S-L Sahonta
R.A. Oliver
C.J. Humphreys
C.T. Foxon
Abstract
Recent developments with group III nitrides suggest AlxGa1-xN based LEDs can be new alternative commer-cially viable deep ultra-violet light sources. Due to a sig-nificant difference in the lattice parameters of GaN and AlN, AlxGa1-xN substrates would be preferable to either GaN or AlN for ultraviolet device applications. We have studied the growth of free-standing wurtzite AlxGa1-xN bulk crystals by plasma-assisted molecular beam epitaxy (PA-MBE) using a novel RF plasma source. Thick wurtz-ite AlxGa1-xN films were grown by PA-MBE on 2-inch GaAs (111)B substrates and were removed from the GaAs substrate after growth to provide free standing AlxGa1-xN samples. Growth rates of AlxGa1-xN up to 3 μm/h have been demonstrated. Our novel high efficiency RF plasma source allowed us to achieve free-standing bulk AlxGa1-xN layers in a single day’s growth, which makes our MBE bulk growth technique commercially vi-able.
Citation
Novikov, S. V., Staddon, C., Sahonta, S.-L., Oliver, R., Humphreys, C., & Foxon, C. (2016). Molecular beam epitaxy of free-standing bulk wurtzite AlxGa1-xN layers using a highly efficient RF plasma source. physica status solidi (c), 13(5-6), https://doi.org/10.1002/pssc.201510166
Journal Article Type | Article |
---|---|
Acceptance Date | Feb 4, 2016 |
Online Publication Date | Feb 25, 2016 |
Publication Date | May 1, 2016 |
Deposit Date | Apr 20, 2016 |
Publicly Available Date | Apr 20, 2016 |
Journal | Physica Status Solidi C: Current Topics in Solid State Physics |
Electronic ISSN | 1862-6351 |
Publisher | Wiley |
Peer Reviewed | Peer Reviewed |
Volume | 13 |
Issue | 5-6 |
DOI | https://doi.org/10.1002/pssc.201510166 |
Keywords | Molecular bean epitaxy; Semiconducting III-V materials; Nitrides; Substrates |
Public URL | https://nottingham-repository.worktribe.com/output/976829 |
Publisher URL | http://onlinelibrary.wiley.com/doi/10.1002/pssc.201510166/abstract |
Contract Date | Apr 20, 2016 |
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Copyright Statement
Copyright information regarding this work can be found at the following address: http://creativecommons.org/licenses/by/4.0
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