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Anodic Sb2S3 Electrodeposition from a Single Source Precursor for Resistive Random-Access Memory Devices

Wallace, A. G.; King, R. P.; Zhelev, N.; Jaafar, A. H.; Levason, W.; Huang, R.; Reid, G.; Bartlett, P. N.

Anodic Sb2S3 Electrodeposition from a Single Source Precursor for Resistive Random-Access Memory Devices Thumbnail


Authors

A. G. Wallace

R. P. King

N. Zhelev

W. Levason

R. Huang

G. Reid

P. N. Bartlett



Abstract

In this paper we report the use of Na3[SbS4].9H2O as a single source precursor for the electrodeposition of Sb2S3 from aqueous electrolyte at pH 9.1. We present the electrochemistry of the [SbS4]3− anion and the redox processes observed for the deposited Sb2S3 film. We show that an amorphous Sb2S3 film can be deposited by anodic electrodeposition onto glassy carbon and that the by-product that accompanies this deposition can be avoided by using a suitable pulse plating approach. Raman spectroscopy and grazing incidence X-ray diffraction were used to characterise the deposits and to show that good quality crystalline films of Sb2S3 are produced on annealing. The crystalline Sb2S3 films were screened for application in Resistive Random-Access Memory, and it was demonstrated that crystalline Sb2S3 films display typical bipolar resistive switching behaviour, and that the resistance ratio between the high resistance state and the low resistance state is approximately one order of magnitude at 1.5 V, which is sufficient for memory applications. A mechanism for the resistive switching is also proposed.

Citation

Wallace, A. G., King, R. P., Zhelev, N., Jaafar, A. H., Levason, W., Huang, R., …Bartlett, P. N. (2022). Anodic Sb2S3 Electrodeposition from a Single Source Precursor for Resistive Random-Access Memory Devices. Electrochimica Acta, 432, Article 141162. https://doi.org/10.1016/j.electacta.2022.141162

Journal Article Type Article
Acceptance Date Sep 7, 2022
Online Publication Date Sep 18, 2022
Publication Date Nov 10, 2022
Deposit Date Oct 3, 2022
Publicly Available Date Oct 5, 2022
Journal Electrochimica Acta
Print ISSN 0013-4686
Publisher Elsevier
Peer Reviewed Peer Reviewed
Volume 432
Article Number 141162
DOI https://doi.org/10.1016/j.electacta.2022.141162
Keywords Electrochemistry; General Chemical Engineering
Public URL https://nottingham-repository.worktribe.com/output/11200860
Publisher URL https://www.sciencedirect.com/science/article/pii/S0013468622013196?via%3Dihub

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