Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering
(2018)
Journal Article
Hanby, B. V., Stuart, B. W., Grant, C., Moffat, J., Blissett, J., Gerada, C., Gimeno-Fabra, M., & Grant, D. M. (2018). Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering. Thin Solid Films, 662, 145-154. https://doi.org/10.1016/j.tsf.2018.07.004
Alumina films (~2 μm thick) were deposited with a mixed Cu/Al interlayer onto copper. Direct current (DC)/Pulsed DC (PDC) magnetron sputtering techniques were independently compared for reactive alumina sputtering. In DC sputtered films, elemental al... Read More about Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering.