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A high-throughput, solvent free method for dispersing metal atoms directly onto supports

Kohlrausch, Emerson C.; Centurion, Higor Andrade; Lodge, Rhys W.; Luo, Xuanli; Slater, Thomas; Santos, Marcos J. L.; Ling, Sanliang; Mastelaro, Valmor R.; Cliffe, Matthew J.; Goncalves, Renato Vitalino; Alves Fernandes, Jesum

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Authors

Emerson C. Kohlrausch

Higor Andrade Centurion

Rhys W. Lodge

Xuanli Luo

Thomas Slater

Marcos J. L. Santos

Valmor R. Mastelaro

Renato Vitalino Goncalves



Abstract

Atomically-dispersed metal catalysts (ADMCs) on surfaces have demonstrated high activity and selectivity in many catalytic reactions. However, dispersing and stabilising individual atoms in support materials in an atom/energy-efficient scalable way still presents a significant challenge. Currently, the synthesis of ADMCs involves many steps and further filtration procedures, creating a substantial hurdle to their production at industrial scale. In this work, we develop a new pathway for producing ADMCs in which Pt atoms are stabilised in the nitrogen-interstices of a graphitic carbon nitride (g-C3N4) framework using scalable, solvent-free, one-pot magnetron sputtering deposition. Our approach has the highest reported rate of ADMC production of 4.8 mg h-1 and generates no chemical waste. Deposition of only 0.5 weight percent of Pt onto g-C3N4 led to improved hydrogen production by factor of ca. 3333 ± 450 when compared to bare g-C3N4. PL analysis showed that the deposition of Pt atoms onto g-C3N4 suppressed the charge carrier recombination from the photogenerated electron-hole pairs of Pt/g-C3N4 thereby enhance hydrogen evolution. Scanning transmission electron microscope imaging before and after the hydrogen evolution reaction revealed that the Pt atoms stabilised in g-C3N4 have a high stability, with no agglomeration observed. Herein, it is shown that this scalable and clean approach can produce effective ADMCs with no further synthetic steps required, and that they can be readily used for catalytic reactions.

Citation

Kohlrausch, E. C., Centurion, H. A., Lodge, R. W., Luo, X., Slater, T., Santos, M. J. L., …Alves Fernandes, J. (2021). A high-throughput, solvent free method for dispersing metal atoms directly onto supports. Journal of Materials Chemistry A, 9(47), 26676-26679. https://doi.org/10.1039/d1ta08372d

Journal Article Type Article
Acceptance Date Nov 17, 2021
Online Publication Date Nov 22, 2021
Publication Date Nov 22, 2021
Deposit Date Jan 25, 2022
Publicly Available Date Jan 26, 2022
Journal Journal of Materials Chemistry A
Print ISSN 2050-7488
Electronic ISSN 2050-7496
Publisher Royal Society of Chemistry
Peer Reviewed Peer Reviewed
Volume 9
Issue 47
Pages 26676-26679
DOI https://doi.org/10.1039/d1ta08372d
Keywords General Materials Science; Renewable Energy, Sustainability and the Environment; General Chemistry
Public URL https://nottingham-repository.worktribe.com/output/7339730
Publisher URL https://pubs.rsc.org/en/content/articlelanding/2021/TA/D1TA08372D

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