Charge Carrier Transport in Van Der Waals Semiconductor InSe Intercalated with RbNO3 Probed by Direct Current Methods

Kudrynskyi, Zakhar R.; Mintyanskii, Illya V.; Savitskii, Petro I.; Kovalyuk, Zakhar D.

Abstract

Layered van der Waals (vdW) semiconductors show great promise to overcome limitations imposed by traditional semiconductor materials. The synergistic combination of vdW semiconductors with other functional materials can offer novel working principles and device concepts for future nano- and optoelectronics. Herein, we investigate the influence of the intercalation of semiconducting n-type InSe vdW crystals with ferroelectric rubidium nitrate (RbNO3) on the transport of charge carriers along and across the layers. The apparent maxima in the temperature dependences of the Hall coefficient are explained in the framework of a model that predicts, along with three-dimensional carriers, the existence of two-dimensional ones contributing only to the conductivity along the layers. The revealed increase of the conductivity anisotropy and its activation variation with temperature, which is mainly due to a decrease of the conductivity across the layers, confirm a two-dimensionalization of electron gas in n-InSe after insertion of the ferroelectric. From the numerical analysis, we determined the densities of carriers of both types, concentrations of donors and acceptors, as well as the value of the interlayer barrier.

Citation

Kudrynskyi, Z. R., Mintyanskii, I. V., Savitskii, P. I., & Kovalyuk, Z. D. (2021). Charge Carrier Transport in Van Der Waals Semiconductor InSe Intercalated with RbNO3 Probed by Direct Current Methods. Applied Sciences, 11(11), Article 5181. https://doi.org/10.3390/app11115181

• Journal Article Type: Article
• Acceptance Date: May 31, 2021
• Online Publication Date: Jun 2, 2021
• Publication Date: Jun 1, 2021
• Deposit Date: Jun 3, 2021
• Publicly Available Date: Jun 3, 2021
• Journal: Applied Sciences
• Electronic ISSN: 2076-3417
• Publisher: MDPI
• Peer Reviewed: Peer Reviewed
• Volume: 11
• Issue: 11
• Article Number: 5181
• DOI: https://doi.org/10.3390/app11115181
• Public URL: https://nottingham-repository.worktribe.com/output/5624053
• Publisher URL: https://www.mdpi.com/2076-3417/11/11/5181