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Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal–organic framework

Cliffe, Matthew J.; Hill, Joshua A.; Murray, Claire A.; Coudert, Fran�ois-Xavier; Goodwin, Andrew L.

Authors

Joshua A. Hill

Claire A. Murray

Fran�ois-Xavier Coudert

Andrew L. Goodwin



Abstract

Thermally-densified hafnium terephthalate UiO-66(Hf) is shown to exhibit the strongest isotropic negative thermal expansion (NTE) effect yet reported for a metal–organic framework (MOF). Incorporation of correlated vacancy defects within the framework affects both the extent of thermal densification and the magnitude of NTE observed in the densified product. We thus demonstrate that defect inclusion can be used to tune systematically the physical behaviour of a MOF.

Citation

Cliffe, M. J., Hill, J. A., Murray, C. A., Coudert, F., & Goodwin, A. L. (2015). Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal–organic framework. Physical Chemistry Chemical Physics, 17(17), 11586-11592. https://doi.org/10.1039/c5cp01307k

Journal Article Type Article
Acceptance Date Mar 31, 2015
Online Publication Date Apr 2, 2015
Publication Date Apr 2, 2015
Deposit Date Dec 20, 2018
Journal Physical Chemistry Chemical Physics
Print ISSN 1463-9076
Electronic ISSN 1463-9084
Publisher Royal Society of Chemistry
Peer Reviewed Peer Reviewed
Volume 17
Issue 17
Pages 11586-11592
DOI https://doi.org/10.1039/c5cp01307k
Public URL https://nottingham-repository.worktribe.com/output/1431493
Publisher URL https://pubs.rsc.org/en/Content/ArticleLanding/2015/CP/C5CP01307K#!divAbstract
Related Public URLs https://arxiv.org/abs/1503.01668