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The chemical throwing power of lithium-based inhibitors from organic coatings on AA2024-T3

Visser, P.; Marcoen, K.; Trindade, G. F.; Abel, M-L.; Watts, J. F.; Hauffman, T.; Mol, J. M. C.; Terryn, H.

Authors

P. Visser

K. Marcoen

M-L. Abel

J. F. Watts

T. Hauffman

J. M. C. Mol

H. Terryn



Abstract

Chemical throwing power, being the distance over which an inhibitor is able to protect a defect effectively, is an important parameter for active protective coatings. This study investigates the chemical throwing power of lithium-based leachable corrosion inhibitors exhibiting different leaching kinetics, from coatings at different inhibitor loading concentrations. The results demonstrate that Li-salt loaded coatings provide corrosion protection of defect areas up to a width of 6 mm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used to detect the lateral spread of Li in the defect areas and provide the chemical speciation of corrosion protective layers in the defect areas.

Journal Article Type Article
Publication Date Apr 15, 2019
Journal Corrosion Science
Print ISSN 0010-938X
Publisher Elsevier
Peer Reviewed Peer Reviewed
Volume 150
Pages 194-206
APA6 Citation Visser, P., Marcoen, K., Trindade, G. F., Abel, M., Watts, J. F., Hauffman, T., …Terryn, H. (2019). The chemical throwing power of lithium-based inhibitors from organic coatings on AA2024-T3. Corrosion Science, 150, 194-206. https://doi.org/10.1016/j.corsci.2019.02.009
DOI https://doi.org/10.1016/j.corsci.2019.02.009
Keywords aluminium, lithium, inhibitor, throwing power, active protection,; 24; ,ToF-SIMS; 25
Publisher URL https://www.sciencedirect.com/science/article/pii/S0010938X18320729
Additional Information This article is maintained by: Elsevier; Article Title: The chemical throwing power of lithium-based inhibitors from organic coatings on AA2024-T3; Journal Title: Corrosion Science; CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.corsci.2019.02.009; Content Type: article; Copyright: © 2019 Elsevier Ltd. All rights reserved.

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