In-situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide
(2018)
Journal Article
Temperton, R., Gibson, A., & O'Shea, J. (2018). In-situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide. Physical Chemistry Chemical Physics, 21(3), 1393-1398. https://doi.org/10.1039/c8cp06912c
Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. This process, carried out using realistic temperatures and pressures (1 mbar, 450 K), was monitored in... Read More about In-situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide.