Garry W. Mudd
High Broad-Band Photoresponsivity of Mechanically Formed InSe-Graphene van der Waals Heterostructures
Mudd, Garry W.; Svatek, Simon A.; Hague, Lee; Makarovsky, Oleg; Kudrynskyi, Zakhar R.; Mellor, Christopher J.; Beton, Peter H.; Eaves, Laurence; Novoselov, Kostya S.; Kovalyuk, Zakhar D.; Vdovin, Evgeny E.; Marsden, Alex J.; Wilson, Neil R.; Patan�, Amalia
Authors
Simon A. Svatek
Lee Hague
Dr OLEG MAKAROVSKIY Oleg.Makarovsky@nottingham.ac.uk
ASSOCIATE PROFESSOR
Zakhar R. Kudrynskyi
Dr CHRISTOPHER MELLOR chris.mellor@nottingham.ac.uk
ASSOCIATE PROFESSOR AND READER IN PHYSICS
Professor Peter Beton peter.beton@nottingham.ac.uk
PROFESSOR OF PHYSICS
Laurence Eaves
Kostya S. Novoselov
Zakhar D. Kovalyuk
Evgeny E. Vdovin
Alex J. Marsden
Neil R. Wilson
Professor Amalia Patane AMALIA.PATANE@NOTTINGHAM.AC.UK
PROFESSOR OF PHYSICS
Abstract
We exploit the broad-band transparency of graphene and the favorable band line up of graphene with van der Waals InSe crystals to create new functional heterostructures and high-performance photodetectors. The InSe-graphene heterostructure exhibits a high photoresponsivity, which exceeds that for other two-dimensional van der Waals crystals, and a spectral response that extends from the near-infrared to the visible spectrum. The highest photoresponsivity is achieved in device architectures where the InSe and graphene layers are vertically stacked, thus enabling effective extraction of photogenerated carriers from the InSe to the graphene electrodes.
Citation
Mudd, G. W., Svatek, S. A., Hague, L., Makarovsky, O., Kudrynskyi, Z. R., Mellor, C. J., Beton, P. H., Eaves, L., Novoselov, K. S., Kovalyuk, Z. D., Vdovin, E. E., Marsden, A. J., Wilson, N. R., & Patanè, A. (2015). High Broad-Band Photoresponsivity of Mechanically Formed InSe-Graphene van der Waals Heterostructures. Advanced Materials, 27(25), 3760-3766. https://doi.org/10.1002/adma.201500889
Journal Article Type | Article |
---|---|
Online Publication Date | May 15, 2015 |
Publication Date | 2015-07 |
Deposit Date | Jul 13, 2015 |
Publicly Available Date | Dec 5, 2019 |
Journal | Advanced Materials |
Print ISSN | 0935-9648 |
Electronic ISSN | 1521-4095 |
Publisher | Wiley |
Peer Reviewed | Peer Reviewed |
Volume | 27 |
Issue | 25 |
Pages | 3760-3766 |
DOI | https://doi.org/10.1002/adma.201500889 |
Keywords | InSe, Graphene, Photoresponsivity |
Public URL | https://nottingham-repository.worktribe.com/output/751957 |
Publisher URL | http://onlinelibrary.wiley.com/doi/10.1002/adma.201500889/full |
Files
Mudd_et_al-2015-Advanced_Materials
(2.8 Mb)
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Publisher Licence URL
https://creativecommons.org/licenses/by/4.0/
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