30 μm thick GaAs X-ray p + -i-n + photodiode grown by MBE
(2019)
Journal Article
Lioliou, G., Poyser, C., Butera, S., Campion, R., Kent, A., & Barnett, A. (2019). 30 μm thick GaAs X-ray p + -i-n + photodiode grown by MBE. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 946, Article 162670. https://doi.org/10.1016/j.nima.2019.162670
7 8 A GaAs p +-in + photodiode detector with a 30 μm thick i layer and a 400 μm diameter was processed using 9 standard wet chemical etching from material grown by molecular beam epitaxy. The detector was 10 characterized for its electrical and photo... Read More about 30 μm thick GaAs X-ray p + -i-n + photodiode grown by MBE.