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Mid-IR plasmonic compound with gallium oxide toplayer formed by GaSb oxidation in water

Bomers, Mario; Di Paola, Davide Maria; Cerutti, Laurent; Michel, Thierry; Arinero, Richard; Tourni�, Eric; Patan�, Amalia; Taliercio, Thierry

Authors

Mario Bomers

Davide Maria Di Paola

Laurent Cerutti

Thierry Michel

Richard Arinero

Eric Tourni�

Thierry Taliercio



Contributors

Abstract

The oxidation of GaSb in aqueous environments has gained interest by the advent of plasmonic antimonide-based compound semiconductors for molecular sensing applications. This work focuses on quantifying the GaSb–water reaction kinetics by studying a model compound system consisting of a 50 nm thick GaSb layer on a 1000 nm thick highly Si-doped epitaxial grown InAsSb layer. Tracing of phonon modes by Raman spectroscopy over 14 h of reaction time shows that within 4 h, the 50 nm of GaSb, opaque for visible light, transforms to a transparent material. Energy-dispersive x-ray spectroscopy shows that the reaction leads to antimony depletion and oxygen incorporation. The final product is a gallium oxide. The good conductivity of the highly Si-doped InAsSb and the absence of conduction states through the oxide are demonstrated by tunneling atomic force microscopy. Measuring the reflectivity of the compound layer structure from 0.3 to 20 μm and fitting of the data by the transfer-matrix method allows us to determine a refractive index value of 1.6 ± 0.1 for the gallium oxide formed in water. The investigated model system demonstrates that corrosion, i.e. antimony depletion and oxygen incorporation, transforms the narrow band gap material GaSb into a gallium oxide transparent in the range from 0.3 to 20 μm.

Citation

Bomers, M., Di Paola, D. M., Cerutti, L., Michel, T., Arinero, R., Tournié, E., …Taliercio, T. (2018). Mid-IR plasmonic compound with gallium oxide toplayer formed by GaSb oxidation in water. Semiconductor Science and Technology, 33(9), Article 095009. https://doi.org/10.1088/1361-6641/aad4bf

Journal Article Type Article
Acceptance Date Jul 20, 2018
Online Publication Date Aug 3, 2018
Publication Date Sep 1, 2018
Deposit Date Sep 27, 2018
Publicly Available Date Aug 4, 2019
Journal Semiconductor Science and Technology
Print ISSN 0268-1242
Electronic ISSN 1361-6641
Publisher IOP Publishing
Peer Reviewed Peer Reviewed
Volume 33
Issue 9
Article Number 095009
DOI https://doi.org/10.1088/1361-6641/aad4bf
Keywords Electrical and Electronic Engineering; Materials Chemistry; Electronic, Optical and Magnetic Materials; Condensed Matter Physics
Public URL https://nottingham-repository.worktribe.com/output/1136152
Publisher URL http://iopscience.iop.org/article/10.1088/1361-6641/aad4bf/meta
Additional Information Journal title: Semiconductor Science and Technology; Article type: paper; Article title: Mid-IR plasmonic compound with gallium oxide toplayer formed by GaSb oxidation in water; Copyright information: © 2018 IOP Publishing Ltd; Date received: 2018-05-23; Date accepted: 2018-07-20; Online publication date: 2018-08-03

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