Phonon-Assisted Resonant Tunneling of Electrons in Graphene–Boron Nitride Transistors

Vdovin, Evgeny E.; Mishchenko, A.; Greenaway, M.T.; Zhu, M.J.; Ghazaryan, D.; Misra, A.; Cao, Y.; Morozov, S.V.; Makarovsky, Oleg; Fromhold, T.M.; Patan�, Amalia; Slotman, G.J.; Katsnelson, M. I; Geim, A.K.; Nososelov, K.S.; Eaves, Laurence

Abstract

We observe a series of sharp resonant features in the differential conductance of graphene-hexagonal boron nitride-graphene tunnel transistors over a wide range of bias voltages between 10 and 200 mV. We attribute them to electron tunneling assisted by the emission of phonons of well-defined energy. The bias voltages at which they occur are insensitive to the applied gate voltage and hence independent of the carrier densities in the graphene electrodes, so plasmonic effects can be ruled out. The phonon energies corresponding to the resonances are compared with the lattice dispersion curves of graphene-boron nitride heterostructures and are close to peaks in the single phonon density of states.

Citation

Vdovin, E. E., Mishchenko, A., Greenaway, M., Zhu, M., Ghazaryan, D., Misra, A., …Eaves, L. (2016). Phonon-Assisted Resonant Tunneling of Electrons in Graphene–Boron Nitride Transistors. Physical Review Letters, 116(18), Article 186603. https://doi.org/10.1103/PhysRevLett.116.186603

• Journal Article Type: Article
• Acceptance Date: Mar 23, 2016
• Online Publication Date: May 5, 2016
• Publication Date: May 5, 2016
• Deposit Date: Apr 22, 2016
• Publicly Available Date: Aug 7, 2018
• Journal: Physical Review Letters
• Print ISSN: 0031-9007
• Electronic ISSN: 1079-7114
• Publisher: American Physical Society
• Peer Reviewed: Peer Reviewed
• Volume: 116
• Issue: 18
• Article Number: 186603
• DOI: https://doi.org/10.1103/PhysRevLett.116.186603
• Public URL: https://nottingham-repository.worktribe.com/output/779521
• Publisher URL: https://journals.aps.org/prl/abstract/10.1103/PhysRevLett.116.186603