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Thin film structural analysis using variable-period x-ray standing waves

Gibson, Joshua S.; Syres, Karen L.; Buckley, Matthew; Lee, Tien-Lin; Thakur, Pardeep K.; Jones, Robert G.

Authors

Joshua S. Gibson

Karen L. Syres

Matthew Buckley

Tien-Lin Lee

Pardeep K. Thakur

Robert G. Jones .



Abstract

Variable period X-ray standing wave (VPXSW) studies have been carried out using 3 keV X-rays and photoelectron detection. Two model surfaces have been used, a native SiO2 layer (20 Å thick) on bulk silicon, and a purpose built multilayer surface comprising a chloroform/water marker layer (12 Å thick) on an ionic liquid spacer layer (211 Å thick) deposited on a SiO2/Si substrate at 90 K. By using photoelectron detection, both chemical and elemental sensitivity were achieved. The surfaces were modelled using dynamic X-ray scattering for X-ray intensity, and attenuation of photoelectrons transmitted through the layers, to produce simulations which accurately reproduced the experimental VPXSW measurements. VPXSW measurements made using the substrate, spacer layer and marker layer photoelectron signatures produced consistent structural values. This work demonstrates that VPXSW can be used to determine chemically specific layer thicknesses within thick (≲ 300 Å) surface structures composed of the light elements B, C, N, O, F and Cl with an accuracy of 10 to 15 Å, perpendicular to the surface. PACS number(s) 68.49.Uv, 61.10.Kw, 68.35.-p, 68.35.Ct

Citation

Gibson, J. S., Syres, K. L., Buckley, M., Lee, T., Thakur, P. K., & Jones, R. G. (2018). Thin film structural analysis using variable-period x-ray standing waves. Physical Review B, 98(16), doi:10.1103/physrevb.98.165402. ISSN 2469-9950

Journal Article Type Article
Acceptance Date Oct 1, 2018
Online Publication Date Oct 1, 2018
Publication Date Oct 15, 2018
Deposit Date Oct 5, 2018
Publicly Available Date Oct 5, 2018
Journal Physical Review B
Print ISSN 2469-9950
Electronic ISSN 2469-9969
Publisher American Physical Society
Peer Reviewed Peer Reviewed
Volume 98
Issue 16
Article Number 165402
DOI https://doi.org/10.1103/physrevb.98.165402
Public URL https://nottingham-repository.worktribe.com/output/1148362
Publisher URL https://journals.aps.org/prb/abstract/10.1103/PhysRevB.98.165402
Additional Information ©2018 American Physical Society

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